Resolution enhancement techniques in optical lithography by Alfred Kwok-Kit Wong

Cover of: Resolution enhancement techniques in optical lithography | Alfred Kwok-Kit Wong

Published by SPIE Optical Engineering Press in Bellingham, WA .

Written in English

Read online

Subjects:

  • Integrated circuits -- Design and construcition,
  • Microlithography

Edition Notes

Includes bibliographical references (p. 189-208) and index.

Book details

StatementAlfred Kwok-Kit Wong.
SeriesTutorial texts in optical engineering -- v. TT 47.
Classifications
LC ClassificationsTK7874 .W647 2001
The Physical Object
Paginationxvii, 214 p. :
Number of Pages214
ID Numbers
Open LibraryOL17599045M
ISBN 100819439959
LC Control Number2001020028
OCLC/WorldCa45879722

Download Resolution enhancement techniques in optical lithography

This tutorial summarizes optical lithography enhancement research and development over the past 20 years. Discusses theoretical and practical aspects of commonly used techniques, including optical imaging and resolution, modified illumination, optical proximity correction, alternating and attenuating phase-shifting masks, selecting RETs, and second-generation by:   It discusses theoretical and practical aspects of commonly used techniques, including optical imaging and resolution, modified illumination, optical proximity correction, alternating and attenuating phase-shifting masks, selecting RETs, and second-generation RETs.

Useful for students and practicing lithographers. As IC device dimensions grow smaller, circuits outpace the introduction of shorter exposure wavelengths and higher numerical aperture lenses, increasing the importance of resolution enhancement.

It discusses theoretical and practical aspects of commonly used techniques, including optical imaging and resolution, modified illumination, optical proximity correction, alternating and attenuating phase-shifting masks, selecting RETs, and second-generation RETs.

Useful for students and practicing lithographers. Selected Papers on Resolution Enhancement Techniques in Optical Lithography (Spie Milestone Series) by F. Schellenberg (Author, Editor) ISBN As IC device dimensions grow smaller, circuits outpace the introduction of shorter exposure wavelengths and higher numerical aperture lenses, increasing the importance of resolution enhancement techniques.

This work summarizes the latest enhancement research that. Optical proximity correction (OPC) methods are resolution en-hancement techniques used extensively in the semiconductor industry to improve the resolution and pattern fidelity of optical lithography.

During the mask data preparation process, the mask pattern is first fractured into basic rectangles, and then fabricated by the variable-shaped-beam.

Optical lithography research has developed several resolution enhancement techniques, including optical proximity correction, off-axis illumination, and phase-shift photomasks [8].

The aim is to maintain high pattern fidelity at maximum resolution. Phase-shifting photomasks offer the best resolution enhancement potential for sub-wavelength. Optical lithography research has developed several resolution enhancement techniques, including optical proximity correction, off-axis illumination, and phase-shift photomasks [8,9].

The aim is to maintain high pattern fidelity at maximum resolution. Phase-shifting photomasks offer the best resolution enhancement potential for sub-wavelength.

Resolution enhancement technologies are methods used to modify the photomasks in the lithographic processes used to make integrated circuits (ICs or "chips") to compensate for limitations in the optical resolution of the projection systems.

Resolution Enhancement Techniques in Optical Lithography Contents xv Preface F.M. Schellenberg Section One 1 Section Introduction Resolution and T irhnoranlw ^ ^n t"ie diffraction of an object-glass with circular aperture.

Optical lithography for integrated circuits is undergoing a renaissance with the adoption of resolution enhancement techniques (RET). Some RET concepts have become routine in manufacturing, almost two decades after the original applications were conceived. This volume gathers together seminal RET papers.

Resolution enhancement optimization methods in optical lithography with improved manufacturability | Ma, Xu | download | BookSC. Download books for free. Find books. 1 Tutordoc; Version 12/9/03 T h e L i t h o g r a p h y E x p e r t (May ) Resolution Enhancement Technologies Chris A.

Mack, KLA-Tencor, FINLE Division, Austin, Texas Classically speaking, optical lithography should have died long ago. Request PDF | On Jan 1,F.M. Schellenberg published Resolution Enhancement Techniques in Optical Lithography | Find, read and cite all the research you need on ResearchGate.

Get this from a library. Resolution enhancement techniques in optical lithography. [Alfred Kwok-Kit Wong] -- Ever-smaller IC devices are pushing the optical lithography envelope, increasing the importance of resolution enhancement techniques.

This tutorial encompasses two decades of research. It discusses. These reprinted papers, some of which are translated into English, show that resolution enhancement techniques are important not only for biomedicine, but also for microfabrication and optical lithography [Schellenberg ].

One can make the claim that advances in technology and instrumentation drives the advances in research. It discusses theoretical and practical aspects of commonly used techniques, including optical imaging and resolution, modified illumination, optical proximity correction, alternating and attenuating phase-shifting masks, selecting RETs, and second-generation RETs.

This book is useful for students and practicing lithographers. Show less. Depth of focus increases as well because the improved image quality is maintained over a larger focus range.

Process latitude enhancement is demonstrated in Fig.where the DOF-EL curves of an isolated k 1 = contact hole for COG and attenuated PSM are shown. Exposure latitude improves from 19% to 26%; depth of focus more than doubles. Resolution enhancement techniques (RETs) have, therefore, been required and proposed.

This paper introduces a phase-shifting mask, a typical RET, points out the problems and inconsistencies of conventional optical imaging theory and explains the image formation concept of.

During this period, many declarations of the demise of optical lithography were made, but each time the technology was salvaged by the introduction of various resolution improvement techniques such as changes in the exposure scheme, improvements in optical systems, exposure wavelength reduction and resolution enhancement technologies.

A readable copy. All pages are intact, and the cover is intact. Pages can include considerable notes-in pen or highlighter-but the notes cannot obscure the text. At ThriftBooks, our motto is: Seller Rating: % positive.

Phase Shifting Lithography (PSL) and Immersion Lithography (IM) are two of these techniques. The focus of this paper is to report the results of using PSL with a broadband UV light exposure and then coupling it with IM.

This was done to produce features with a high aspect ratio and high resolution. Introduction: PSL has extended optical. Resolution Enhancement Technologies (RETs) A collection of techniques such as optical proximity correction, phase shifting masks, and off-axis illumination, designed to improve the usable resolution of an optical lithography tool of a given numerical aperture and wavelength.

This review provides a comprehensive overview of resolution enhancement techniques and technical innovations in mask aligner lithography, especially the fabrication of periodic structures for nano-optical components.

The review concludes with a comparative discussion of the different techniques. 2 days ago  Books Description: This tutorial summarizes optical lithography enhancement research and development over the past 20 years.

Discusses theoretical and practical aspects of commonly used techniques, including optical imaging and resolution, modified illumination, optical proximity correction, alternating and attenuating phase-shifting masks, selecting RETs, and second-generation RETs.

ultraviolet (> nm and lithography equipment. Commonly used molecular transition lines in Hg-Xe bulbs are nm (g-line), (i-line), and nm. All other wavelengths are filtered out.

Lasers are used to increase resolution, and decrease the optical complexity for deep ultraviolet (DUV) lithography systems. Resolution enhancement techniques for achieving subwavelength optical lithography are presented.

Various types of phase shift mask (PSM) techniques and their imaging characteristics are discussed and compared to conventional binary mask technique. Resolution enhancement techniques (RETs) aim to improve wafer image quality through manipulating the amplitude and phase of the optical wave to pre-compensate wafer image distortions.

Since next-generation lithography (NGL) is still not mature enough, the industry relies heavily on RETs, wherein optical proximity correction (OPC) is dominant. Fundamental to all of these processes is lithography, ie, the formation of three-dimensional relief images on the substrate for subsequent transfer of the pattern to the substrate.

This book presents a complete theoretical and practical treatment of the topic of lithography for both students and researchers.5/5(1). Alfred Kwok-Kit Wong is the author of Resolution Enhancement Techniques in Optical Lithography ( avg rating, 0 ratings, 0 reviews, published ) and.

Optical Lithographic Techniques and Theory Basic Overview Over the past three decades, the length-scales of the component devices have decreased from around 15µm to around nm. However, the means by which the components are manufactured, optical lithography, remains principally the same.

Optical lithography comprises. Optical lithography is one of the most challenging areas of current integrated circuit manufacturing technology. The semiconductor industry is relying more on resolution enhancement techniques (RETs), since their implementation does not require significant changes in fabrication infrastructure.

Because of this reasons, OPC is considered as one of the resolution enhancement techniqies (RET) for optical lithographic processes. It simulates imaging system model described by Hopkins equation and improves the mask image and reduces pattern transfer error. Resolution Enhancement Techniques in Optical Lithography (SPIE Tutorial Texts in Optical Engineering Vol.

TT47) Principles of Lithography, Second Edition (SPIE Press Monograph Vol. PM) The Hubble Cosmos: 25 Years of New Vistas in Space. A Unified Summary of the Models and Optimization Methods Used in Computational Lithography Optical lithography is one of the most challenging areas of current integrated circuit manufacturing technology.

The semiconductor industry is relying more on resolution enhancement techniques (RETs), since their implementation does not require significant changes in. Computational Lithography is the first book to address the computational optimization of RETs in optical lithography, providing an in-depth discussion of optimal optical proximity correction (OPC), phase shifting mask (PSM), and off-axis illumination (OAI) RET tools that use model-based mathematical optimization book starts with.

Optical projection lithography: Optical projection lithography has been the predominant method of micro- and nano-patterning for most semiconductor and nanotech. Book Journal Nanolithography Publication Date Pages 1–41 illumination, and techniques for resolution enhancement.

Abstract: Optical proximity correction (OPC) and phase shifting masks (PSM) are resolution enhancement techniques (RET) used extensively in the semiconductor industry to improve the resolution and pattern fidelity of optical lithography.

In. Computational Lithography is the first book to address the computational optimization of RETs in optical lithography, providing an in-depth discussion of optimal optical proximity correction (OPC), phase shifting mask (PSM), and off-axis illumination (OAI) RET tools that use model-based mathematical optimization approaches.

Resolution Enhancement Techniques in Optical Lithography Wong, Alfred Kwok-Kit () Ever-smaller IC devices are pushing the optical lithography envelope, increasing the importance of resolution enhancement techniques.While e-beam lithography has demonstrated high resolution (~10 nm) it is not without its drawbacks, most notably the exceptionally high capital equipment cost.

Optical tip-enhanced nano-lithography could obtain the same resolution at a small fraction of the cost.The download resolution of Matthew Arnold, ' The Bookman, April Wells and the Giants, ' The Bookman, December The Poetic Quality in download resolution enhancement techniques in optical lithography, ' The using Age, Vol.

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